RENA Technologies GmbH

Semiconductor
Our manual and fully automatic wet benches create the ideal conditions for your small- and large-scale production of semiconductor elements. Integrating wet chemical etching, cleaning, and drying processes facilitates front-end-of-line (FEOL) and back-end-of-line (BEOL) applications.

Our platforms can be flexibly adapted to your production process. Flexibly combine the removal of deposits with piranha solutions, RCA cleaning, hot phos etching, and Marangoni drying in your production sequence. This same flexibility can be achieved in both mass production and in purpose-built machinery for your research work or small-scale production.