RENA Technologies GmbH

semiconductor
Our manual and fully automatic wet benches offer ideal conditions for your small and large series production of semiconductor elements. The integration of wet chemical etching, cleaning and drying processes allows front-end-of-line (FEOL) and back-end-of-line (BEOL) applications.

Our platforms adapt flexibly to your manufacturing process. Integrate the removal of residues with piranha solution, RCA cleaning, HotPhos etching or Marangoni drying into your production process. You get this flexibility in mass production as well as with specially designed machines for your research company or small series production.